Silicon nitride (SiN) substrates are used for SPM operation in Contact Mode AFM. SiN substrates consist of a cantilever integrated with a sharp tip on the end. For Contact Mode AFM imaging, the cantilever must be soft enough to deflect very small forces and have a high enough resonant frequency to avoid vibrational instabilities.
The most straightforward approach is to center the photodetector at 0 V Vertical Deflection before engaging on the sample, and upon engage the tip is pushed into the sample with enough force to deflect the cantilever until the Vertical Deflection matches the Deflection Setpoint.
Since the photodetector is most linear at the center of its range, the method 1 is not optimal. An alternate approach enables the AFM to scan with the Vertical Deflection at the centered (0 V) on the photodetector:
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